Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7482219 | Technique for creating different mechanical strain by a contact etch stop layer stack with an intermediate etch stop layer | Kai Frohberg, Carsten Peters, Heike Salz | 2009-01-27 |
| 7416973 | Method of increasing the etch selectivity in a contact structure of semiconductor devices | Carsten Peters, Heike Salz, Ralf Richter | 2008-08-26 |
| 7396718 | Technique for creating different mechanical strain in different channel regions by forming an etch stop layer stack having differently modified intrinsic stress | Kai Frohberg, Joerg Hohage, Holger Schuehrer | 2008-07-08 |
| 7314793 | Technique for controlling mechanical stress in a channel region by spacer removal | Kai Frohberg, Massud Aminpur, Martin Mazur, Roberto Klingler | 2008-01-01 |
| 7309654 | Technique for reducing etch damage during the formation of vias and trenches in interlayer dielectrics | Massud Aminpur, James Werking | 2007-12-18 |
| 7279415 | Method for forming a metallization layer stack to reduce the roughness of metal lines | Kai Frohberg | 2007-10-09 |
| 7122410 | Polysilicon line having a metal silicide region enabling linewidth scaling including forming a second metal silicide region on the substrate | Thorsten Kammler, Karsten Wieczorek | 2006-10-17 |
| 7098140 | Method of compensating for etch rate non-uniformities by ion implantation | Christoph Schwan, Carsten Hartig | 2006-08-29 |
| 7005305 | Signal layer for generating characteristic optical plasma emissions | Gunter Grasshoff, Christoph Schwan | 2006-02-28 |