Issued Patents 2025
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12412749 | Etching method and plasma processing system | Maju TOMURA | 2025-09-09 |
| 12400863 | Method for etching for semiconductor fabrication | Yu-Hao Tsai, Du Zhang, Mingmei Wang, Takatoshi Orui, Motoi Takahashi +2 more | 2025-08-26 |
| 12400835 | Plasma processing method and plasma processing system | Satoshi OHUCHIDA, Koki MUKAIYAMA, Noboru Saito, Maju TOMURA | 2025-08-26 |
| 12387936 | Plasma processing method and plasma processing system | Kae Takahashi, Maju TOMURA | 2025-08-12 |
| 12387941 | Etching method and plasma processing apparatus | Takahiro Yokoyama, Maju TOMURA, Satoshi OHUCHIDA | 2025-08-12 |
| 12368027 | Substrate processing method and substrate processing apparatus | Takatoshi Orui, Ryutaro SUDA, Maju TOMURA, Kae KUMAGAI | 2025-07-22 |
| 12334343 | Substrate processing method and substrate processing system | Toru Hisamatsu, Takayuki Katsunuma, Shinya Ishikawa, Masanobu Honda | 2025-06-17 |
| 12308212 | In-situ adsorbate formation for plasma etch process | Du Zhang, Yu-Hao Tsai, Masahiko Yokoi, Mingmei Wang | 2025-05-20 |
| 12198938 | Etching method | Takatoshi Orui, Ryutaro SUDA, Maju TOMURA | 2025-01-14 |