Issued Patents 2025
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424447 | Method to selectively etch silicon nitride to silicon oxide using water crystallization | Mingmei Wang, Du Zhang | 2025-09-23 |
| 12400863 | Method for etching for semiconductor fabrication | Du Zhang, Mingmei Wang, Takatoshi Orui, Motoi Takahashi, Masahiko Yokoi +2 more | 2025-08-26 |
| 12308212 | In-situ adsorbate formation for plasma etch process | Du Zhang, Masahiko Yokoi, Yoshihide Kihara, Mingmei Wang | 2025-05-20 |
| 12287578 | Cyclic method for reactive development of photoresists | Hamed Hajibabaeinajafabadi, Akiteru Ko, Sergey Voronin | 2025-04-29 |
| 12272558 | Selective and isotropic etch of silicon over silicon-germanium alloys and dielectrics; via new chemistry and surface modification | Matthew Flaugh, Jonathan Hollin, Subhadeep Kal, Pingshan Luan, Hamed Hajibabaeinajafabadi +1 more | 2025-04-08 |