Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11538691 | Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks | Nihar Mohanty, Angelique Raley, Aelan Mosden, Scott Lefevre | 2022-12-27 |
| 11444082 | Semiconductor apparatus having stacked gates and method of manufacture thereof | Jeffrey Smith, Anton J. deVilliers, Kandabara Tapily, Gerrit J. Leusink | 2022-09-13 |
| 11424123 | Forming a semiconductor feature using atomic layer etch | Eric Chih-Fang Liu, Akiteru Ko, Angelique Raley, Henan Zhang, Shan Hu | 2022-08-23 |
| 11380554 | Gas phase etching system and method | Nihar Mohanty, Angelique Raley, Aelan Mosden, Scott Lefevre | 2022-07-05 |
| 11322401 | Reverse contact and silicide process for three-dimensional semiconductor devices | Jeffrey Smith, Lars Liebmann, Daniel Chanemougame, Hiroki Niimi, Kandabara Tapily +2 more | 2022-05-03 |
| 11322350 | Non-plasma etch of titanium-containing material layers with tunable selectivity to alternate metals and dielectrics | Daisuke Ito, Shinji Irie, Aelan Mosden | 2022-05-03 |
| 11264274 | Reverse contact and silicide process for three-dimensional logic devices | Jeffrey Smith, Hiroaki Niimi, Jodi Grzeskowiak, Daniel Chanemougame, Lars Liebmann +2 more | 2022-03-01 |