KT

Kandabara Tapily

TL Tokyo Electron Limited: 16 patents #4 of 896Top 1%
📍 Albany, NY: #3 of 143 inventorsTop 3%
🗺 New York: #73 of 12,227 inventorsTop 1%
Overall (2022): #3,165 of 548,613Top 1%
16
Patents 2022

Issued Patents 2022

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
11532517 Localized etch stop layer Yun Han, Andrew Metz, Xinghua Sun, David L. O'Meara, Henan Zhang +1 more 2022-12-20
11456212 Platform and method of operating for integrated end-to-end fully self-aligned interconnect process Robert D. Clark, Kai-Hung Yu 2022-09-27
11444082 Semiconductor apparatus having stacked gates and method of manufacture thereof Jeffrey Smith, Anton J. deVilliers, Subhadeep Kal, Gerrit J. Leusink 2022-09-13
11443953 Method for forming and using stress-tuned silicon oxide films in semiconductor device patterning Anton J. deVilliers, Gerrit J. Leusink 2022-09-13
11443949 Method of selectively forming metal silicides for semiconductor devices 2022-09-13
11398379 Platform and method of operating for integrated end-to-end self-aligned multi-patterning process Robert D. Clark, Richard A. Farrell, Angelique Raley, Sophie Thibaut 2022-07-26
11374101 Dual metal wrap-around contacts for semiconductor devices Hiroaki Niimi, Takahiro Hakamata 2022-06-28
11335599 Self-aligned contacts for 3D logic and memory Lars Liebmann, Jeffrey Smith, Anton J. deVilliers 2022-05-17
11322401 Reverse contact and silicide process for three-dimensional semiconductor devices Jeffrey Smith, Lars Liebmann, Daniel Chanemougame, Hiroki Niimi, Subhadeep Kal +2 more 2022-05-03
11302588 Platform and method of operating for integrated end-to-end area-selective deposition process Robert D. Clark, Jason Mehigan 2022-04-12
11264254 Substrate processing tool with integrated metrology and method of using Robert D. Clark 2022-03-01
11264289 Method for threshold voltage tuning through selective deposition of high-K metal gate (HKMG) film stacks Jeffrey Smith, Lars Liebmann, Daniel Chanemougame, Mark I. Gardner, H. Jim Fulford +1 more 2022-03-01
11264274 Reverse contact and silicide process for three-dimensional logic devices Jeffrey Smith, Hiroaki Niimi, Jodi Grzeskowiak, Daniel Chanemougame, Lars Liebmann +2 more 2022-03-01
11251077 Method of forming a semiconductor device with air gaps for low capacitance interconnects 2022-02-15
11251200 Coaxial contacts for 3D logic and memory Lars Liebmann, Jeffrey Smith, Anton J. deVilliers 2022-02-15
11217583 Architecture design of monolithically integrated 3D CMOS logic and memory Lars Liebmann, Jeffrey Smith, Anton J. deVilliers 2022-01-04