Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11532517 | Localized etch stop layer | Andrew Metz, Xinghua Sun, David L. O'Meara, Kandabara Tapily, Henan Zhang +1 more | 2022-12-20 |
| 11527413 | Cyclic plasma etch process | Peter L. G. Ventzek, Alok Ranjan | 2022-12-13 |
| 11342195 | Methods for anisotropic etch of silicon-based materials with selectivity to organic materials | Peter Ventzek, Alok Ranjan | 2022-05-24 |