Issued Patents 2022
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537040 | Extreme ultraviolet mask blank hard mask materials | Shuwei Liu, Wen Xiao, Azeddine Zerrade | 2022-12-27 |
| 11515132 | Physical vapor deposition processing systems target cooling | Sanjay Bhat, Vishwas Kumar Pandey | 2022-11-29 |
| 11513437 | Extreme ultraviolet mask absorber materials | Shiyu Liu, Shuwei Liu | 2022-11-29 |
| 11480866 | Method and apparatus to anneal EUV mask blank | Herng Yau Yoong, Wen Xiao, Ribhu Gautam, Sanjay Bhat | 2022-10-25 |
| 11480865 | Method and apparatus to improve EUV mask blank flatness | Sanjay Bhat, Wen Xiao, Vinodh Ramachandran | 2022-10-25 |
| 11467499 | System and method of measuring refractive index of EUV mask absorber | Wen Xiao, Huajun Liu, Herng Yau Yoong | 2022-10-11 |
| 11454876 | EUV mask blank absorber defect reduction | Binni Varghese, Azeddine Zerrade, Shiyu Liu, Ramya Ramalingam | 2022-09-27 |
| 11422096 | Surface topography measurement apparatus and method | Weimin Li, Wen Xiao, Sanjay Bhat | 2022-08-23 |
| 11390940 | System and method to control PVD deposition uniformity | Wen Xiao, Sanjay Bhat | 2022-07-19 |
| 11387085 | Multicathode deposition system | Sanjay Bhat, Kamatchigobinath Manoharan | 2022-07-12 |
| 11385536 | EUV mask blanks and methods of manufacture | Wen Xiao | 2022-07-12 |
| 11365475 | Physical vapor deposition chamber cleaning processes | Shiyu Liu, Sanjay Bhat, Shuwei Liu, Wen Xiao | 2022-06-21 |
| 11366059 | System and method to measure refractive index at specific wavelengths | Wen Xiao, Huajun Liu, Herng Yau Yoong | 2022-06-21 |
| 11366379 | Extreme ultraviolet mask with embedded absorber layer | Wen Xiao | 2022-06-21 |
| 11327394 | Graded interface in bragg reflector | Wen Xiao, Weimin Li, Shuwei Liu | 2022-05-10 |
| 11300872 | Extreme ultraviolet mask absorber materials | Shuwei Liu | 2022-04-12 |
| 11300871 | Extreme ultraviolet mask absorber materials | Shiyu Liu, Shuwei Liu, Azeddine Zerrade | 2022-04-12 |
| 11275302 | Extreme ultraviolet mask absorber materials | Shuwei Liu | 2022-03-15 |
| 11275300 | Extreme ultraviolet mask blank defect reduction | Sai Abhinand, Shuwei Liu, Hui Ni Grace Fong, Ke Chang | 2022-03-15 |
| 11275304 | Extreme ultraviolet mask absorber matertals | Shuwei Liu | 2022-03-15 |
| 11275303 | Extreme ultraviolet mask absorber matertals | Shuwei Liu | 2022-03-15 |
| 11249388 | Extreme ultraviolet mask absorber materials | Shuwei Liu | 2022-02-15 |
| 11249390 | Extreme ultraviolet mask absorber materials | Shuwei Liu, Halbert Chong | 2022-02-15 |
| 11249389 | Extreme ultraviolet mask absorber materials | Shuwei Liu | 2022-02-15 |
| 11249386 | Extreme ultraviolet mask with backside coating | Madhavi R. Chandrachood, Vikash Banthia | 2022-02-15 |