Issued Patents 2021
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11158509 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Ching-Yu Chang +7 more | 2021-10-26 |
| 11145674 | 3D memory device and method of manufacturing the same | Wen-Jer Tsai | 2021-10-12 |
| 11123319 | Methods and compositions for treating edema refractory to oral diuretics | Balasingam Radhakrishnan, Ben ESQUE, Andrew Xian Chen | 2021-09-21 |
| 11094556 | Method of manufacturing semiconductor devices using directional process | Ya-Wen Yeh, Yu-Tien Shen, Shih-Chun Huang, Po-Chin Chang, Yung-Sung Yen +4 more | 2021-08-17 |
| 11081354 | Fin patterning methods for increased process margins | Chin-Yuan Tseng, Li-Te Lin, Ru-Gun Liu, Min Cao | 2021-08-03 |
| 11075079 | Directional deposition for semiconductor fabrication | Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Ya Hui Chang, Yung-Sung Yen +3 more | 2021-07-27 |
| 11043381 | Directional patterning method | Po-Chin Chang, Li-Te Lin, Ru-Gun Liu, Pinyen Lin, Yu-Tien Shen +1 more | 2021-06-22 |
| 11004729 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chin-Hsiang Lin, Chih-Ming Lai, Yung-Sung Yen | 2021-05-11 |
| 10971363 | Method for forming semiconductor device structure | Chih-Ming Lai, Shih-Ming Chang, Chin-Yuan Tseng, Ru-Gun Liu | 2021-04-06 |
| 10957551 | Fin-like field effect transistor patterning methods for increasing process margins | Chin-Yuan Tseng, Hsin-Chih Chen, Shi Ning Ju, Ken-Hsien Hsieh, Yung-Sung Yen +1 more | 2021-03-23 |
| 10950456 | High-density semiconductor device | Lei-Chun Chou, Chih-Liang Chen, Chih-Ming Lai, Charles Chew-Yuen Young, Chin-Yuan Tseng +6 more | 2021-03-16 |