Issued Patents 2021
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11158509 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chin-Hsiang Lin, Chien-Wei Wang, Chih-Yuan Ting +7 more | 2021-10-26 |
| 11143963 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Wei-Han Lai, Tzu-Yang Lin, Ming-Hui Weng, Chin-Hsiang Lin | 2021-10-12 |
| 11137685 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Chin-Hsiang Lin | 2021-10-05 |
| 11127592 | Photosensitive groups in resist layer | Ya-Ching Chang, Chin-Hsiang Lin, Yen-Hao Chen | 2021-09-21 |
| 11112698 | Photoresist with gradient composition for improved uniformity | Chang Lilin, Chin-Hsiang Lin | 2021-09-07 |
| 11106138 | Lithography process and material for negative tone development | Chien-Wei Wang, Wei-Han Lai | 2021-08-31 |
| 11094541 | Anti-reflective coating materials | Yu-Chung Su | 2021-08-17 |
| 11079681 | Lithography method for positive tone development | Ming-Hui Weng, Chen-Yu Liu, Cheng-Han Wu, Chin-Hsiang Lin | 2021-08-03 |
| 11073763 | Photoresist and method | Wei-Han Lai, Chen-Hau Wu | 2021-07-27 |
| 11069528 | Semiconductor device and method | Jung-Hau Shiu, Jen Hung Wang, Tze-Liang Lee | 2021-07-20 |
| 11054742 | EUV metallic resist performance enhancement via additives | An-Ren Zi, Joy Cheng | 2021-07-06 |
| 11043388 | Integrated circuit fabrication system with adjustable gas injector and method utilizing the same | Yung-Shun Hsu, Chiao-Kai Chang, Wai Hong Cheah, Chien-Fang Lin | 2021-06-22 |
| 11037820 | Method for forming vias and method for forming contacts in vias | Tzu-Yang Lin, Cheng-Han Wu, Chin-Hsiang Lin | 2021-06-15 |
| 11036137 | Method for forming semiconductor structure | An-Ren Zi, Chin-Hsiang Lin | 2021-06-15 |
| 11037882 | Overlay mark | Chen Chen, Ming-Feng Shieh | 2021-06-15 |
| 11029602 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin, Yahru Cheng | 2021-06-08 |
| 11022886 | Bottom-up material formation for planarization | Ming-Hui Weng, Cheng-Han Wu, Chin-Hsiang Lin | 2021-06-01 |
| 11022885 | Photosensitive middle layer | Chun-Chih HO, Kuan-Hsin Lo, Chin-Hsiang Lin | 2021-06-01 |
| 11016386 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Chin-Hsiang Lin | 2021-05-25 |
| 11009796 | Method for forming semiconductor structure | Ming-Hui Weng, An-Ren Zi, Chin-Hsiang Lin, Chen-Yu Liu | 2021-05-18 |
| 11012549 | Smart phone with a text recognition module | Chi-Wen Liu, Kuo-Ching CHIANG | 2021-05-18 |
| 11003082 | Method for forming semiconductor structure | Chien-Chih Chen, Yahru Cheng | 2021-05-11 |
| 11003097 | Immersion lithography system using a sealed wafer bath | Burn Jeng Lin | 2021-05-11 |
| 11003084 | Method for forming semiconductor structure | Li-Yen Lin, Chin-Hsiang Lin | 2021-05-11 |
| 10990013 | Method for forming semiconductor structure | An-Ren Zi, Chin-Hsiang Lin | 2021-04-27 |