Issued Patents 2021
Showing 26–27 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10978301 | Morphology of resist mask prior to etching | Jung-Hau Shiu, Wei-Ren Wang, Shing-Chyang Pan, Tze-Liang Lee | 2021-04-13 |
| 10915027 | Post development treatment method and material for shrinking critical dimension of photoresist layer | Siao-Shan Wang | 2021-02-09 |