Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10915027 | Post development treatment method and material for shrinking critical dimension of photoresist layer | Ching-Yu Chang | 2021-02-09 |
SW
Siao-Shan Wang
Overall (2021): #256,468 of 548,734Top 50%
1
Patents 2021