Issued Patents 2021
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11204545 | EUV photo masks and manufacturing method thereof | Pei-Cheng Hsu, Ching-Huang Chen, Hung-Yi Tsai, Ming-Wei Chen, Ta-Cheng Lien | 2021-12-21 |
| 11143954 | Mask patterns and method of manufacture | Wen-Chang Hsueh, Ta-Cheng Lien, Chia-Jen Chen | 2021-10-12 |
| 11143952 | Pellicle removal method | Chue-San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh +2 more | 2021-10-12 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2021-10-05 |
| 11119398 | EUV photo masks | Pei-Cheng Hsu, Ping-Hsun Lin, Ta-Cheng Lien, Tzu Yi Wang | 2021-09-14 |
| 11106126 | Method of manufacturing EUV photo masks | Pei-Cheng Hsu, Ta-Cheng Lien, Tzu Yi Wang | 2021-08-31 |
| 11086215 | Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same | Yun-Yue Lin | 2021-08-10 |
| 11048158 | Method for extreme ultraviolet lithography mask treatment | Pei-Cheng Hsu, Yih-Chen Su, Chi-Kuang Tsai, Ta-Cheng Lien, Tzu Yi Wang +1 more | 2021-06-29 |
| 11042084 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Chia-Jen Chen, Chih-Cheng Lin, Ping-Hsun Lin | 2021-06-22 |
| 11029593 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2021-06-08 |
| 11022874 | Chromeless phase shift mask structure and process | Yun-Yue Lin | 2021-06-01 |
| 10996553 | Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same | Wen-Chang Hsueh, Huan-Ling Lee, Chia-Jen Chen | 2021-05-04 |