Issued Patents 2021
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Chin-Hsiang Lin | 2021-10-05 |
| 11092555 | EUV vessel inspection method and related system | Chun-Lin Chang, Shang-Chieh Chien, Shang-Ying WU, Li-Kai Cheng, Tzung-Chi Fu +4 more | 2021-08-17 |
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Jeng-Horng Chen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu | 2021-07-27 |
| 10976672 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Jeng-Horng Chen, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien +1 more | 2021-04-13 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2021-04-13 |
| 10955746 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin | 2021-03-23 |