Issued Patents 2021
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Shinn-Sheng Yu, Chia-Chen Chen, Anthony Yen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2021-07-27 |
| 11003069 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Chih-Tsung Shih, Ching-Wei Shen | 2021-05-11 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Shinn-Sheng Yu, Anthony Yen | 2021-04-13 |
| 10976672 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien +1 more | 2021-04-13 |