Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11086227 | Method to mitigate defect printability for ID pattern | Yen-Cheng Lu, Chia-Hao Hsu, Chia-Chen Chen, Jeng-Horng Chen, Anthony Yen | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Jeng-Horng Chen, Anthony Yen | 2021-07-27 |
| 10976655 | Extreme ultraviolet lithography system, device, and method for printing low pattern density features | Yen-Cheng Lu, Jeng-Horng Chen, Anthony Yen | 2021-04-13 |
| 10955746 | Lithography method with reduced impacts of mask defects | Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2021-03-23 |