Issued Patents 2021
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11150561 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-10-19 |
| 11119420 | Particle prevention method in lithography exposure apparatus | Yi-Wei Lee, Jui-Chieh Chen, Tsung Chuan Lee | 2021-09-14 |
| 11086209 | EUV lithography mask with a porous reflective multilayer structure | Shih-Chang Shih, Li-Jui Chen, Po-Chung Cheng | 2021-08-10 |
| 11073755 | Mask with multilayer structure and manufacturing method by using the same | Jeng-Horng Chen, Shinn-Sheng Yu, Anthony Yen | 2021-07-27 |
| 11024623 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-06-01 |
| 11003069 | High durability extreme ultraviolet photomask | Chia-Hao Yu, Chi-Lun Lu, Ching-Wei Shen, Jeng-Horng Chen | 2021-05-11 |
| 10997706 | Reticle backside inspection method | Zi-Wen Chen, Po-Chung Cheng, Li-Jui Chen, Shih-Chang Shih | 2021-05-04 |
| 10976674 | Method for detecting EUV pellicle rupture | Bo-Tsun Liu, Tsung Chuan Lee | 2021-04-13 |
| 10962881 | Method and apparatus for lithography in semiconductor fabrication | Cheng-Kuan Wu, Po-Chung Cheng, Li-Jui Chen | 2021-03-30 |