Issued Patents 2021
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11143954 | Mask patterns and method of manufacture | Wen-Chang Hsueh, Ta-Cheng Lien, Hsin-Chang Lee | 2021-10-12 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2021-10-05 |
| 11042084 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Hsin-Chang Lee, Chih-Cheng Lin, Ping-Hsun Lin | 2021-06-22 |
| 11029593 | Lithography mask with a black border regions and method of fabricating the same | Chin-Hsiang Lin, Chien-Cheng Chen, Hsin-Chang Lee, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2021-06-08 |
| 10996553 | Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same | Wen-Chang Hsueh, Huan-Ling Lee, Hsin-Chang Lee | 2021-05-04 |