Issued Patents 2021
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11156912 | Lithography mask and method for manufacturing the same | — | 2021-10-26 |
| 11143951 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | — | 2021-10-12 |
| 11143952 | Pellicle removal method | Chue-San Yoo, Chih-Chiang Tu, Chien-Cheng Chen, Jong-Yuh Chang, Kun-Lung Hsieh +2 more | 2021-10-12 |
| 11137672 | Mask and method for forming the same | — | 2021-10-05 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2021-10-05 |
| 11106127 | Structure of pellicle-mask structure with vent structure | — | 2021-08-31 |
| 11086215 | Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the same | Hsin-Chang Lee | 2021-08-10 |
| 11022874 | Chromeless phase shift mask structure and process | Hsin-Chang Lee | 2021-06-01 |
| 11016383 | Pellicle for an EUV lithography mask and a method of manufacturing thereof | — | 2021-05-25 |
| 10962873 | Extreme ultraviolet mask and method of manufacturing the same | — | 2021-03-30 |