Issued Patents 2020
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10866090 | Estimating amplitude and phase asymmetry in imaging technology for achieving high accuracy in overlay metrology | Tal Marciano, Nadav Gutman, Guy M. Cohen, Vladimir Levinski | 2020-12-15 |
| 10824079 | Diffraction based overlay scatterometry | Yuval Lubashevsky, Vladimir Levinski, Amnon Manassen | 2020-11-03 |
| 10677588 | Localized telecentricity and focus optimization for overlay metrology | Andrew V. Hill, Ohad Bachar, Avi Abramov, Dor Perry | 2020-06-09 |
| 10579768 | Process compatibility improvement by fill factor modulation | Vladimir Levinski, Eitan Hajaj, Tal Itzkovich, Sharon Aharon, Michael Adel +5 more | 2020-03-03 |
| 10565697 | Utilizing overlay misregistration error estimations in imaging overlay metrology | Tzahi Grunzweig, Nadav Gutman, David Gready, Mark Ghinovker, Vladimir Levinski +2 more | 2020-02-18 |