Issued Patents 2020
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10865475 | Deposition of metal borides and silicides | Petri Raisanen, Eric James Shero, Robert Brennan Milligan, Michael Eugene Givens | 2020-12-15 |
| 10867788 | Method of forming a structure on a substrate | Timothee Blanquart | 2020-12-15 |
| 10854444 | Sulfur-containing thin films | Fu Tang, Michael Eugene Givens, Jan Willem Maes, Qi Xie | 2020-12-01 |
| 10854460 | Deposition of organic films | Eva Tois, Hidemi Suemori, Viljami Pore, Varun Sharma | 2020-12-01 |
| 10851456 | Deposition of metal borides | Chiyu Zhu, Kiran Shrestha | 2020-12-01 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Atsuki Fukazawa, Hideaki Fukuda, Antti Niskanen, Ryu Nakano +1 more | 2020-09-22 |
| 10707082 | Methods for depositing thin films comprising indium nitride by atomic layer deposition | Viljami Pore, Antti Niskanen | 2020-07-07 |
| 10665425 | Atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2020-05-26 |
| 10662533 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2020-05-26 |
| 10662534 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Marko Tuominen, Chiyu Zhu | 2020-05-26 |
| 10636889 | Titanium aluminum and tantalum aluminum thin films | Michael Eugene Givens, Eric James Shero, Jerry Winkler, Petri Raisanen, Timo Asikainen +2 more | 2020-04-28 |
| 10612137 | Organic reactants for atomic layer deposition | Antti Niskanen, Eva Tois, Hidemi Suemori | 2020-04-07 |
| 10573511 | Methods for forming silicon nitride thin films | Antti Niskanen, Jaakko Anttila | 2020-02-25 |
| 10553424 | Sulfur-containing thin films | Fu Tang, Michael Eugene Givens, Jan Willem Maes, Qi Xie | 2020-02-04 |
| 10553440 | Methods for depositing nickel films and for making nickel silicide and nickel germanide | Viljami Pore, Tom E. Blomberg, Eva Tois | 2020-02-04 |