Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10847365 | Method of forming conformal silicon carbide film by cyclic CVD | Masaru Zaitsu | 2020-11-24 |
| 10784105 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2020-09-22 |
| 10755922 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Yoshio Susa, Toshio Nakanishi | 2020-08-25 |
| 10720322 | Method for forming silicon nitride film selectively on top surface | Dai Ishikawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2020-07-21 |
| 10655221 | Method for depositing oxide film by thermal ALD and PEALD | Hideaki Fukuda | 2020-05-19 |
| 10529554 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun +4 more | 2020-01-07 |