Issued Patents 2020
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10720322 | Method for forming silicon nitride film selectively on top surface | Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, SeungJu Chun +4 more | 2020-07-21 |
| 10707073 | Film forming method and patterning method | Yoshio Susa, Yuko Kengoyama | 2020-07-07 |
| 10580645 | Plasma enhanced atomic layer deposition (PEALD) of SiN using silicon-hydrohalide precursors | Shinya Ueda, Toshiya Suzuki | 2020-03-03 |
| 10529554 | Method for forming silicon nitride film selectively on sidewalls or flat surfaces of trenches | Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, SeungJu Chun +4 more | 2020-01-07 |