Issued Patents 2020
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10755922 | Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition | Timothee Blanquart, Mitsuya Utsuno, Yoshio Susa, Atsuki Fukazawa | 2020-08-25 |