Issued Patents 2020
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10854444 | Sulfur-containing thin films | Suvi Haukka, Fu Tang, Michael Eugene Givens, Qi Xie | 2020-12-01 |
| 10847361 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, David Kurt de Roest, Julian Hsieh +2 more | 2020-11-24 |
| 10793946 | Reaction chamber passivation and selective deposition of metallic films | Delphine Longrie, Antti Niskanen, Han Wang, Qi Xie, Shang Chen +4 more | 2020-10-06 |
| 10741394 | Combined anneal and selective deposition process | Werner Knaepen, Roel Gronheid, Arjun Singh | 2020-08-11 |
| 10699899 | Atomic layer deposition of antimony oxide films | Raija H. Matero, Linda Lindroos, Hessel Sprey, David Kurt de Roest, Dieter Pierreux +3 more | 2020-06-30 |
| 10665452 | Source/drain performance through conformal solid state doping | Qi Xie, David Kurt de Roest, Jacob Woodruff, Michael Eugene Givens, Timothee Blanquart | 2020-05-26 |
| 10643904 | Methods for forming a semiconductor device and related semiconductor device structures | Qi Xie, Michael Givens, Petri Raisanen | 2020-05-05 |
| 10607895 | Method for forming a semiconductor device structure comprising a gate fill metal | Qi Xie, Chiyu Zhu, Kiran Shrestha, Pauline Calka, Oreste Madia +1 more | 2020-03-31 |
| 10566185 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, David Kurt de Roest, Julian Hsieh +2 more | 2020-02-18 |
| 10551741 | Method of forming a directed self-assembled layer on a substrate | Werner Knaepen, Maarten Stokhof, Roel Gronheid, Hari Pathangi Sriraman | 2020-02-04 |
| 10553482 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, David Kurt de Roest, Julian Hsieh +4 more | 2020-02-04 |
| 10553424 | Sulfur-containing thin films | Suvi Haukka, Fu Tang, Michael Eugene Givens, Qi Xie | 2020-02-04 |