Issued Patents 2020
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10851456 | Deposition of metal borides | Kiran Shrestha, Suvi Haukka | 2020-12-01 |
| 10847361 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, Jan Willem Maes, David Kurt de Roest +2 more | 2020-11-24 |
| 10734497 | Methods for forming a semiconductor device structure and related semiconductor device structures | Kiran Shrestha, Petri Raisanen, Michael Eugene Givens | 2020-08-04 |
| 10662533 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen | 2020-05-26 |
| 10662534 | Thermal atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen | 2020-05-26 |
| 10665425 | Atomic layer etching processes | Tom E. Blomberg, Varun Sharma, Suvi Haukka, Marko Tuominen | 2020-05-26 |
| 10636889 | Titanium aluminum and tantalum aluminum thin films | Suvi Haukka, Michael Eugene Givens, Eric James Shero, Jerry Winkler, Petri Raisanen +2 more | 2020-04-28 |
| 10607895 | Method for forming a semiconductor device structure comprising a gate fill metal | Qi Xie, Kiran Shrestha, Pauline Calka, Oreste Madia, Jan Willem Maes +1 more | 2020-03-31 |
| 10566185 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, Jan Willem Maes, David Kurt de Roest +2 more | 2020-02-18 |
| 10553482 | Selective deposition of aluminum and nitrogen containing material | Han Wang, Qi Xie, Delphine Longrie, Jan Willem Maes, David Kurt de Roest +4 more | 2020-02-04 |
| 10541173 | Selective deposition method to form air gaps | — | 2020-01-21 |
| 10529563 | Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures | Tom E. Blomberg | 2020-01-07 |