Issued Patents 2019
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520823 | EUV lithography system and method with optimized throughput and stability | Yen-Cheng Lu, Shun-Der Wu, Anthony Yen | 2019-12-31 |
| 10520806 | Pellicle for EUV mask and fabrication thereof | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-12-31 |
| 10514610 | Lithography patterning with a gas phase resist | Shu-Hao Chang, Kuo-Chang Kau, Kevin Huang | 2019-12-24 |
| 10459352 | Mask cleaning | Shu-Hao Chang, Norman Chen, Kuo-Chang Kau, Ming-Chin Chien, Shang-Chieh Chien +2 more | 2019-10-29 |
| 10459353 | Lithography system with an embedded cleaning module | Shang-Chieh Chien, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu +3 more | 2019-10-29 |
| 10274819 | EUV pellicle fabrication methods and structures thereof | Pei-Cheng Hsu, Chih-Tsung Shih, Chih-Cheng Lin, Hsin-Chang Lee, Shinn-Sheng Yu +2 more | 2019-04-30 |
| 10276372 | Method for integrated circuit patterning | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-04-30 |
| 10274838 | System and method for performing lithography process in semiconductor device fabrication | Jui-Ching Wu, Chia-Chen Chen, Shu-Hao Chang, Shang-Chieh Chien, Ming-Chin Chien +1 more | 2019-04-30 |
| 10168611 | Mask with multilayer structure and manufacturing method by using the same | Chih-Tsung Shih, Shinn-Sheng Yu, Anthony Yen | 2019-01-01 |