Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10514597 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen, Chin-Hsiang Lin | 2019-12-24 |
| 10394114 | Chromeless phase shift mask structure and process | Yun-Yue Lin | 2019-08-27 |
| 10353285 | Pellicle structures and methods of fabricating thereof | Pei-Cheng Hsu, Yun-Yue Lin, Hsuan-Chen Chen, Hsuan-I WANG, Anthony Yen | 2019-07-16 |
| 10345695 | Extreme ultraviolet alignment marks | Yi-Fu Hsieh, Chih-Chiang Tu, Jong-Yuh Chang | 2019-07-09 |
| 10295899 | Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask | Chia-Jen Chen, Chih-Cheng Lin, Ping-Hsun Lin | 2019-05-21 |
| 10274819 | EUV pellicle fabrication methods and structures thereof | Pei-Cheng Hsu, Chih-Tsung Shih, Jeng-Horng Chen, Chih-Cheng Lin, Shinn-Sheng Yu +2 more | 2019-04-30 |