Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504744 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, Felix Kozakevich +2 more | 2019-12-10 |
| 10381201 | Control of etch rate using modeling, feedback and impedance match | Bradford J. Lyndaker, John C. Valcore, Jr., Seyed Jafar Jafarian-Tehrani, Zhigang Chen | 2019-08-13 |
| 10340122 | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing | Zhigang Chen, John Holland | 2019-07-02 |
| 10304662 | Multi regime plasma wafer processing to increase directionality of ions | Lin Zhao, Felix Kozakevich, Kenneth Lucchesi, Zhigang Chen, John Holland | 2019-05-28 |
| 10283330 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Felix Kozakevich, Michael C. Kellogg, John Holland, Zhigang Chen, Kenneth Lucchesi +1 more | 2019-05-07 |
| 10276348 | Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing system | Eric A. Hudson, Rajinder Dhindsa, Neil Benjamin | 2019-04-30 |
| 10249476 | Control of impedance of RF return path | Rajinder Dhindsa, Ken Lucchesi, Luc Albarede | 2019-04-02 |
| 10181412 | Negative ion control for dielectric etch | Mirzafer Abatchev, Rajinder Dhindsa, Eric A. Hudson, Andrew D. Bailey, III | 2019-01-15 |