Issued Patents 2019
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10504744 | Three or more states for achieving high aspect ratio dielectric etch | Takumi Yanagawa, Nikhil Dole, Ranadeep Bhowmick, Eric A. Hudson, Felix Kozakevich +2 more | 2019-12-10 |
| 10395902 | Chamber with vertical support stem for symmetric conductance and RF delivery | Daniel Arthur Brown, Michael C. Kellogg, James E. Tappan, Jerrel K. Antolik, Ian Kenworthy +2 more | 2019-08-27 |
| 10340122 | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing | Zhigang Chen, Alexei Marakhtanov | 2019-07-02 |
| 10304662 | Multi regime plasma wafer processing to increase directionality of ions | Alexei Marakhtanov, Lin Zhao, Felix Kozakevich, Kenneth Lucchesi, Zhigang Chen | 2019-05-28 |
| 10283330 | Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators | Alexei Marakhtanov, Felix Kozakevich, Michael C. Kellogg, Zhigang Chen, Kenneth Lucchesi +1 more | 2019-05-07 |
| 10257887 | Substrate support assembly | Alexander Matyushkin, Dan Katz, Theodoros Panagopoulos, Michael D. Willwerth | 2019-04-09 |
| RE47275 | Substrate support providing gap height and planarization adjustment in plasma processing chamber | Jerrell K. ANTOLIK, Yen-Kun Wang | 2019-03-05 |