Issued Patents 2019
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10519547 | Susceptor design to eliminate deposition valleys in the wafer | Karthik Ramanathan, Kartik Shah, Nyi O. Myo, Jeffrey Tobin, Errol Antonio C. Sanchez +1 more | 2019-12-31 |
| 10504723 | Method and apparatus for selective epitaxy | Xuebin Li, Hua Chung, Flora Fong-Song CHANG, Abhishek Dube | 2019-12-10 |
| 10504717 | Integrated system and method for source/drain engineering | Chun YAN, Xinyu BAO, Melitta Hon, Hua Chung | 2019-12-10 |
| 10356848 | Lamp heating for process chamber | Mehmet Tugrul Samir | 2019-07-16 |
| 10332739 | UV radiation system and method for arsenic outgassing control in sub 7nm CMOS fabrication | Chun YAN, Xinyu BAO, Hua Chung | 2019-06-25 |
| 10312096 | Methods for titanium silicide formation using TiCl4 precursor and silicon-containing precursor | Hua Chung, Matthias Bauer, Satheesh Kuppurao | 2019-06-04 |
| 10276688 | Selective process for source and drain formation | Xinyu BAO, Zhiyuan Ye, Flora Fong-Song CHANG, Abhishek Dube, Xuebin Li +2 more | 2019-04-30 |
| 10269647 | Self-aligned EPI contact flow | Ying Zhang, Xinyu BAO, Regina Freed, Hua Chung | 2019-04-23 |
| 10269614 | Susceptor design to reduce edge thermal peak | Kartik Shah, Anhthu Ngo, Karthik Ramanathan, Nitin Pathak, Nyi O. Myo +8 more | 2019-04-23 |
| 10260164 | Methods and apparatus for deposition processes | Nyi O. Myo, Kevin Joseph Bautista, Zhiyuan Ye, Yihwan Kim | 2019-04-16 |
| 10224421 | Self-aligned process for sub-10nm fin formation | Zhiyuan Ye, Xinyu BAO, Chun Yan, Hua Chung, Satheesh Kuppurao | 2019-03-05 |
| 10199215 | Apparatus and method for selective deposition | Abhishek Dube, Jessica S. Kachian, David Thompson, Jeffrey W. Anthis | 2019-02-05 |