Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522404 | Fully self-aligned via | Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra, Ho-yung David Hwang | 2019-12-31 |
| 10510602 | Methods of producing self-aligned vias | Abhijit Basu Mallick, Yung-Chen Lin, Qingjun Zhou, He Ren, Ho-yung David Hwang +1 more | 2019-12-17 |
| 10510540 | Mask scheme for cut pattern flow with enlarged EPE window | Qingjun Zhou, Yung-Chen Lin, Ho-yung David Hwang | 2019-12-17 |
| 10453684 | Method for patterning a material layer with desired dimensions | Lin Zhou | 2019-10-22 |
| 10439047 | Methods for etch mask and fin structure formation | Yung-Chen Lin, Qingjun Zhou | 2019-10-08 |
| 10424507 | Fully self-aligned via | Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra, Ho-yung David Hwang | 2019-09-24 |
| 10418229 | Aerosol deposition coating for semiconductor chamber components | Jennifer Y. Sun, Biraja P. Kanungo, Tom K. Cho | 2019-09-17 |
| 10410921 | Fully self-aligned via | Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra, Ho-yung David Hwang | 2019-09-10 |
| 10269647 | Self-aligned EPI contact flow | Schubert S. Chu, Xinyu BAO, Regina Freed, Hua Chung | 2019-04-23 |
| 10204781 | Methods for bottom up fin structure formation | Yung-Chen Lin, Qingjun Zhou, Xinyu BAO | 2019-02-12 |