Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10522404 | Fully self-aligned via | Ying Zhang, Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra | 2019-12-31 |
| 10510540 | Mask scheme for cut pattern flow with enlarged EPE window | Ying Zhang, Qingjun Zhou, Yung-Chen Lin | 2019-12-17 |
| 10510602 | Methods of producing self-aligned vias | Ying Zhang, Abhijit Basu Mallick, Yung-Chen Lin, Qingjun Zhou, He Ren +1 more | 2019-12-17 |
| 10424507 | Fully self-aligned via | Ying Zhang, Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra | 2019-09-24 |
| 10410921 | Fully self-aligned via | Ying Zhang, Abhijit Basu Mallick, Regina Freed, Nitin K. Ingle, Uday Mitra | 2019-09-10 |
| 10274839 | Two-dimensional marks | Wen-Zhan Zhou, Heng-Jen Lee, Chen-Ming Wang, Kai-Hsiung Cheng, Chih-Ming Ke | 2019-04-30 |