Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510540 | Mask scheme for cut pattern flow with enlarged EPE window | Ying Zhang, Yung-Chen Lin, Ho-yung David Hwang | 2019-12-17 |
| 10510602 | Methods of producing self-aligned vias | Ying Zhang, Abhijit Basu Mallick, Yung-Chen Lin, He Ren, Ho-yung David Hwang +1 more | 2019-12-17 |
| 10439047 | Methods for etch mask and fin structure formation | Yung-Chen Lin, Ying Zhang | 2019-10-08 |
| 10204781 | Methods for bottom up fin structure formation | Yung-Chen Lin, Xinyu BAO, Ying Zhang | 2019-02-12 |