Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10224421 | Self-aligned process for sub-10nm fin formation | Zhiyuan Ye, Xinyu BAO, Hua Chung, Schubert S. Chu, Satheesh Kuppurao | 2019-03-05 |
| 10177017 | Method for conditioning a processing chamber for steady etching rate control | — | 2019-01-08 |