Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10483355 | Forming non-line-of-sight source drain extension in an NMOS FINFET using n-doped selective epitaxial growth | Hans-Joachim L. Gossmann, Benjamin Colombeau | 2019-11-19 |
| 10312096 | Methods for titanium silicide formation using TiCl4 precursor and silicon-containing precursor | Hua Chung, Schubert S. Chu, Satheesh Kuppurao | 2019-06-04 |