Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10483355 | Forming non-line-of-sight source drain extension in an NMOS FINFET using n-doped selective epitaxial growth | Matthias Bauer, Benjamin Colombeau | 2019-11-19 |
| 10381465 | Method for fabricating asymmetrical three dimensional device | Shiyu Sun, Naomi Yoshida, Benjamin Colombeau | 2019-08-13 |