Issued Patents 2018
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10147599 | Methods for depositing low K and low wet etch rate dielectric thin films | Ning Li, Mark Saly, Mihaela Balseanu, Li-Qun Xia | 2018-12-04 |
| 10121671 | Methods of depositing metal films using metal oxyhalide precursors | Xinyu Fu, David Knapp, Jeffrey W. Anthis, Mei Chang | 2018-11-06 |
| 10109534 | Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) | Adam Brand, Naomi Yoshida, Seshadri Ganguli, Mei Chang | 2018-10-23 |
| 10109520 | Methods for depositing dielectric barrier layers and aluminum containing etch stop layers | Sree Rangasai V. Kesapragada, Kevin Moraes, Srinivas Guggilla, He Ren, Mehul Naik +6 more | 2018-10-23 |
| 10096514 | Seamless trench fill using deposition/etch techniques | Jeffrey W. Anthis | 2018-10-09 |
| 10036089 | Methods of depositing a metal alloy film | Jeffrey W. Anthis | 2018-07-31 |
| 9982345 | Deposition of metal films using beta-hydrogen free precursors | David Knapp, Jeffrey W. Anthis | 2018-05-29 |
| 9916975 | Precursors of manganese and manganese-based compounds for copper diffusion barrier layers and methods of use | Feng Q. Liu, Ben-Li Sheu, David Knapp | 2018-03-13 |
| 9914995 | Alcohol assisted ALD film deposition | Feng Q. Liu, Mei Chang | 2018-03-13 |
| 9911591 | Selective deposition of thin film dielectrics using surface blocking chemistry | Mark Saly, Bhaskar Jyoti Bhuyan | 2018-03-06 |
| 9857027 | Apparatus and method for self-regulating fluid chemical delivery | Martin Jeff Salinas, Youqun Dong, Mei Chang | 2018-01-02 |