Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10109534 | Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD) | Adam Brand, Naomi Yoshida, David Thompson, Mei Chang | 2018-10-23 |
| 9926639 | Methods for forming barrier/seed layers for copper interconnect structures | Hoon Kim, Wei Ti Lee, Sang Ho Yu, Hyoung-Chan Ha, Sang-Hyeob Lee | 2018-03-27 |