Issued Patents 2017
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9773676 | Lithography using high selectivity spacers for pitch reduction | Yu-Sheng Chang, Cheng-Hsiung Tsai, Chung-Ju Lee, Hai-Ching Chen, Hsiang-Huan Lee +5 more | 2017-09-26 |
| 9761436 | Mechanisms for forming patterns using multiple lithography processes | Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu, Tsai-Sheng Gau | 2017-09-12 |
| 9735140 | Systems and methods for a sequential spacer scheme | Shih-Ming Chang, Ru-Gun Liu, Tsai-Sheng Gau | 2017-08-15 |
| 9711604 | Loading effect reduction through multiple coat-etch processes | Jin-Dah Chen, Han-Wei Wu, Yu-Hsien Lin, Po-Chun Liu, Stan Chen | 2017-07-18 |
| 9673328 | Structure and method for providing line end extensions for fin-type active regions | Shao-Ming Yu, Chang-Yun Chang, Chih-Hao Chang, Hsin-Chih Chen, Kai-Tai Chang +2 more | 2017-06-06 |
| 9634001 | System and methods for converting planar design to FinFET design | Clement Hsingjen Wann, Chih-Sheng Chang, Yi-Tang Lin, Ting-Chu Ko, Chung-Hsien Chen | 2017-04-25 |
| 9627262 | Method of patterning features of a semiconductor device | Wei-Chao Chiu, Chen Chen, Chih-Ming Lai, Nian-Fuh Cheng, Ru-Gun Liu +1 more | 2017-04-18 |
| 9595440 | Method of using a vaporizing spray system to perform a trimming process | Ching-Yu Chang, Kuei-Liang Lu | 2017-03-14 |
| 9581900 | Self aligned patterning with multiple resist layers | Chih-Ming Lai, Ken-Hsien Hsieh, Ru-Gun Liu, Shih-Ming Chang | 2017-02-28 |
| 9576814 | Method of spacer patterning to form a target integrated circuit pattern | Chieh-Han Wu, Cheng-Hsiung Tsai, Chung-Ju Lee, Ru-Gun Liu, Shau-Lin Shue +1 more | 2017-02-21 |
| 9564327 | Method for forming line end space structure using trimmed photo resist | Chia-Ying Lee, Jyu-Horng Shieh, Shih-Ming Chang, Chih-Ming Lai, Ken-Hsien Hsieh +1 more | 2017-02-07 |