| 9852260 |
Method and recording medium of reducing chemoepitaxy directed self-assembled defects |
Michael A. Guillorn, Kafai Lai, Ananthan Raghunathan, HsinYu Tsai |
2017-12-26 |
| 9847232 |
Pattern-forming method |
Hitoshi Osaki, Kristin Schmidt |
2017-12-19 |
| 9837407 |
Semiconductor device with increased source/drain area |
Kangguo Cheng, Peng Xu, Jie Yang |
2017-12-05 |
| 9831324 |
Self-aligned inner-spacer replacement process using implantation |
Robin Hsin Kuo Chao, Michael A. Guillorn, Shogo Mochizuki, Chun Wing Yeung |
2017-11-28 |
| 9810980 |
Graphoepitaxy directed self assembly |
Hongyun Cottle, Cheng Chi, Kristin Schmidt |
2017-11-07 |
| 9811554 |
Assisting query and querying |
Li Li, Ju Wei Shi, Qi Yu |
2017-11-07 |
| 9768059 |
High-chi block copolymers for interconnect structures by directed self-assembly |
Teddie Peregrino Magbitang, Daniel P. Sanders, Kristin Schmidt, Ankit Vora |
2017-09-19 |
| 9738765 |
Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers |
Markus Brink, Joy Cheng, Gregory S. Doerk, Alexander Friz, Michael A. Guillorn +4 more |
2017-08-22 |
| 9659824 |
Graphoepitaxy directed self-assembly process for semiconductor fin formation |
Joy Cheng, Matthew E. Colburn, Michael A. Guillorn, Melia Tjio, HsinYu Tsai |
2017-05-23 |
| 9632408 |
Graphoepitaxy directed self assembly |
Hongyun Cottle, Cheng Chi, Kristin Schmidt |
2017-04-25 |
| 9576817 |
Pattern decomposition for directed self assembly patterns templated by sidewall image transfer |
Joy Cheng, Michael A. Guillorn, HsinYu Tsai |
2017-02-21 |
| 9563122 |
Method to harden photoresist for directed self-assembly processes |
Joy Cheng, Matthew E. Colburn |
2017-02-07 |
| 9552988 |
Tone inverted directed self-assembly (DSA) fin patterning |
Hong He, Alexander Reznicek, Chiahsun Tseng, Tenko Yamashita |
2017-01-24 |
| 9536750 |
Method for fin formation with a self-aligned directed self-assembly process and cut-last scheme |
Cheng Chi, Fee Li Lie, Ruilong Xie |
2017-01-03 |
