| 9728534 |
Densely spaced fins for semiconductor fin field effect transistors |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2017-08-08 |
| 9728419 |
Fin density control of multigate devices through sidewall image transfer processes |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2017-08-08 |
| 9646929 |
Making an efuse |
Hsueh-Chung Chen, Chun-Chen Yeh, Ailian Zhao |
2017-05-09 |
| 9634000 |
Partially isolated fin-shaped field effect transistors |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2017-04-25 |
| 9634117 |
Self-aligned contact process enabled by low temperature |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2017-04-25 |
| 9627263 |
Stop layer through ion implantation for etch stop |
Hong He, Siva Kanakasabapathy, Yunpeng Yin, Junli Wang |
2017-04-18 |
| 9583585 |
Gate structure integration scheme for fin field effect transistors |
Hong He, Chun-Chen Yeh, Yunpeng Yin |
2017-02-28 |
| 9552988 |
Tone inverted directed self-assembly (DSA) fin patterning |
Hong He, Chi-Chun Liu, Alexander Reznicek, Tenko Yamashita |
2017-01-24 |
| 9543407 |
Low-K spacer for RMG finFET formation |
Hong He, Tenko Yamashita, Chun-Chen Yeh, Yunpeng Yin |
2017-01-10 |
