JC

Joy Cheng

IBM: 8 patents #615 of 10,852Top 6%
TSMC: 2 patents #920 of 2,832Top 35%
Overall (2017): #7,290 of 506,227Top 2%
10
Patents 2017

Issued Patents 2017

Patent #TitleCo-InventorsDate
9812358 FinFET structures and methods of forming the same Yen-Chun Huang, Ting-Ting Chen, Yu-Chung Su, Ling-Fu Nieh, Pin-Chuan Su +2 more 2017-11-07
9738765 Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers Markus Brink, Gregory S. Doerk, Alexander Friz, Michael A. Guillorn, Chi-Chun Liu +4 more 2017-08-22
9691615 Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring Markus Brink, Gregory S. Doerk, Michael A. Guillorn, HsinYu Tsai 2017-06-27
9684236 Method of patterning a film layer Ken-Hsien Hsieh, Kuan-Hsin Lo, Shih-Ming Chang, Wei-Liang Lin, Chun-Kuang Chen +5 more 2017-06-20
9659824 Graphoepitaxy directed self-assembly process for semiconductor fin formation Matthew E. Colburn, Michael A. Guillorn, Chi-Chun Liu, Melia Tjio, HsinYu Tsai 2017-05-23
9576817 Pattern decomposition for directed self assembly patterns templated by sidewall image transfer Michael A. Guillorn, Chi-Chun Liu, HsinYu Tsai 2017-02-21
9574107 Fluoro-alcohol additives for orientation control of block copolymers Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora 2017-02-21
9563122 Method to harden photoresist for directed self-assembly processes Matthew E. Colburn, Chi-Chun Liu 2017-02-07
9562127 Methods of forming block polymers for directed self-assembly Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora 2017-02-07
9556353 Orientation control materials for block copolymers used in directed self-assembly applications Anindarupa Chunder, Melia Tjio, Ankit Vora 2017-01-31