Issued Patents 2017
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9812358 | FinFET structures and methods of forming the same | Yen-Chun Huang, Ting-Ting Chen, Yu-Chung Su, Ling-Fu Nieh, Pin-Chuan Su +2 more | 2017-11-07 |
| 9738765 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | Markus Brink, Gregory S. Doerk, Alexander Friz, Michael A. Guillorn, Chi-Chun Liu +4 more | 2017-08-22 |
| 9691615 | Chemoepitaxy-based directed self assembly process with tone inversion for unidirectional wiring | Markus Brink, Gregory S. Doerk, Michael A. Guillorn, HsinYu Tsai | 2017-06-27 |
| 9684236 | Method of patterning a film layer | Ken-Hsien Hsieh, Kuan-Hsin Lo, Shih-Ming Chang, Wei-Liang Lin, Chun-Kuang Chen +5 more | 2017-06-20 |
| 9659824 | Graphoepitaxy directed self-assembly process for semiconductor fin formation | Matthew E. Colburn, Michael A. Guillorn, Chi-Chun Liu, Melia Tjio, HsinYu Tsai | 2017-05-23 |
| 9576817 | Pattern decomposition for directed self assembly patterns templated by sidewall image transfer | Michael A. Guillorn, Chi-Chun Liu, HsinYu Tsai | 2017-02-21 |
| 9574107 | Fluoro-alcohol additives for orientation control of block copolymers | Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora | 2017-02-21 |
| 9563122 | Method to harden photoresist for directed self-assembly processes | Matthew E. Colburn, Chi-Chun Liu | 2017-02-07 |
| 9562127 | Methods of forming block polymers for directed self-assembly | Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora | 2017-02-07 |
| 9556353 | Orientation control materials for block copolymers used in directed self-assembly applications | Anindarupa Chunder, Melia Tjio, Ankit Vora | 2017-01-31 |