Issued Patents 2011
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8064056 | Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-11-22 |
| 8054467 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2011-11-08 |
| 8029953 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Richard Johannes Franciscus Van Haren | 2011-10-04 |
| 7969577 | Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate | Roy Werkman, Everhardus Cornelis Mos | 2011-06-28 |
| 7916276 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Richard Johannes Franciscus Van Haren | 2011-03-29 |
| 7911612 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Antoine Gaston Marie Kiers, Arie Jeffrey Den Boef | 2011-03-22 |
| 7898662 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-03-01 |
| 7897058 | Device manufacturing method and computer program product | Richard Johannes Franciscus Van Haren, Ewoud Vreugdenhil, Harry Sewell | 2011-03-01 |
| 7879682 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Bart Rijpers | 2011-02-01 |