Issued Patents 2011
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8064056 | Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization | Maurits Van Der Schaar, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-11-22 |
| 8054467 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers, Paul Frank Luehrmann +4 more | 2011-11-08 |
| 8031337 | Angularly resolved scatterometer | — | 2011-10-04 |
| 7961309 | Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate | Reinder Teun Plug, Karel Diederick Van Der Mast | 2011-06-14 |
| 7916284 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Mircea Dusa, Hugo Augustinus Joseph Cramer | 2011-03-29 |
| 7911612 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Antoine Gaston Marie Kiers, Maurits Van Der Schaar | 2011-03-22 |
| 7898662 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Maurits Van Der Schaar, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-03-01 |
| 7879682 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Richard Johannes Franciscus Van Haren, Jacobus Burghoorn, Maurits Van Der Schaar, Bart Rijpers | 2011-02-01 |
| 7880889 | Angularly resolved scatterometer and inspection method | — | 2011-02-01 |