Issued Patents 2004
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835578 | Test structure for differentiating the line and via contribution in stress migration | Chin-Chiu Hsia | 2004-12-28 |
| 6797627 | Dry-wet-dry solvent-free process after stop layer etch in dual damascene process | Hsin-Ching Shih, Yi-Nien Su, Li-Chie Chiao | 2004-09-28 |
| 6797630 | Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach | Tsang-Jiuh Wu, Chen-Nan Yeh, Li-Chih Chao | 2004-09-28 |
| 6794302 | Dynamic feed forward temperature control to achieve CD etching uniformity | Li-Shiun Chen, Ming-Ching Chang, Huan-Just Lin, Yung-Hog Chiu, Hun-Jan Tao | 2004-09-21 |
| 6743732 | Organic low K dielectric etch with NH3 chemistry | Li-Chih Chao, Chia-Shiung Tsai | 2004-06-01 |
| 6720256 | Method of dual damascene patterning | Tsang-Jiuh Wu, Li-Chih Chao | 2004-04-13 |