Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797630 | Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach | Tsang-Jiuh Wu, Chen-Nan Yeh, Li-Te Lin | 2004-09-28 |
| 6743732 | Organic low K dielectric etch with NH3 chemistry | Li-Te Lin, Chia-Shiung Tsai | 2004-06-01 |
| 6727183 | Prevention of spiking in ultra low dielectric constant material | Ching-Hui Ma, Jen-Cheng Liu | 2004-04-27 |
| 6720256 | Method of dual damascene patterning | Tsang-Jiuh Wu, Li-Te Lin | 2004-04-13 |