HS

Hsin-Ching Shih

TSMC: 1 patents #234 of 898Top 30%
📍 Changhua City, TW: #19 of 93 inventorsTop 25%
Overall (2004): #206,157 of 270,089Top 80%
1
Patents 2004

Issued Patents 2004

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6797627 Dry-wet-dry solvent-free process after stop layer etch in dual damascene process Yi-Nien Su, Li-Te Lin, Li-Chie Chiao 2004-09-28