Issued Patents 2003
Showing 51–63 of 63 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6541184 | Nozzle arm movement for resist development | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur | 2003-04-01 |
| 6535288 | Machine readable code to trigger data collection | Bharath Rangarajan, Michael K. Templeton, Khoi A. Phan | 2003-03-18 |
| 6534418 | Use of silicon containing imaging layer to define sub-resolution gate structures | Marina V. Plat, Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian | 2003-03-18 |
| 6528398 | Thinning of trench and line or contact spacing by use of dual layer photoresist | Kouros Ghandehari, Angela T. Hui | 2003-03-04 |
| 6516528 | System and method to determine line edge roughness and/or linewidth | Bryan K. Choo | 2003-02-11 |
| 6514849 | Method of forming smaller contact size using a spacer hard mask | Angela T. Hui | 2003-02-04 |
| 6515342 | Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion | Subhash Gupta, Carmen Morales | 2003-02-04 |
| 6514874 | Method of using controlled resist footing on silicon nitride substrate for smaller spacing of integrated circuit device features | James Yu, Angela T. Hui | 2003-02-04 |
| 6514868 | Method of creating a smaller contact using hard mask | Angela T. Hui | 2003-02-04 |
| 6514867 | Method of creating narrow trench lines using hard mask | Angela T. Hui | 2003-02-04 |
| 6513996 | Integrated equipment to drain water-hexane developer for pattern collapse | Ramkumar Subramanian, Michael K. Templeton | 2003-02-04 |
| 6510730 | System and method for facilitating selection of optimized optical proximity correction | Khoi A. Phan, Ramkumar Subramanian | 2003-01-28 |
| 6507474 | Using localized ionizer to reduce electrostatic charge from wafer and mask | Ramkumar Subramanian, Khoi A. Phan, Bryan K. Choo, Bharath Rangarajan | 2003-01-14 |