Issued Patents 2003
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660645 | Process for etching an organic dielectric using a silyated photoresist mask | Scott A. Bell, Todd P. Lukanc, Christopher F. Lyons, Ramkumar Subramanian | 2003-12-09 |
| 6635409 | Method of strengthening photoresist to prevent pattern collapse | Christopher F. Lyons, Scott A. Bell, Todd P. Lukanc | 2003-10-21 |
| 6606738 | Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology | Scott A. Bell, Amada Wilkison, Chih-Yuh Yang | 2003-08-12 |
| 6605546 | Dual bake for BARC fill without voids | Ramkumar Subramanian, Wolfram Grundke, Bhanwar Singh, Christopher F. Lyons | 2003-08-12 |
| 6589711 | Dual inlaid process using a bilayer resist | Ramkumar Subramanian, Christopher F. Lyons, Bhanwar Singh | 2003-07-08 |
| 6586339 | Silicon barrier layer to prevent resist poisoning | Robert B. Ogle, Lewis Shen | 2003-07-01 |
| 6566214 | Method of making a semiconductor device by annealing a metal layer to form metal silicide and using the metal silicide as a hard mask to pattern a polysilicon layer | Christopher F. Lyons, Ramkumar Subramanian, Scott A. Bell, Todd P. Lukanc | 2003-05-20 |
| 6563221 | Connection structures for integrated circuits and processes for their formation | Scott A. Bell, Todd P. Lukanc, Christopher F. Lyons, Ramkumar Subramanian | 2003-05-13 |
| 6558965 | Measuring BARC thickness using scatterometry | Bhanwar Singh, Ramkumar Subramanian, Christopher F. Lyons | 2003-05-06 |
| 6548423 | Multilayer anti-reflective coating process for integrated circuit fabrication | Christopher F. Lyons, Scott A. Bell, Todd P. Lukanc | 2003-04-15 |
| 6541360 | Bi-layer trim etch process to form integrated circuit gate structures | Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian, Bhanwar Singh | 2003-04-01 |
| 6534418 | Use of silicon containing imaging layer to define sub-resolution gate structures | Scott A. Bell, Christopher F. Lyons, Ramkumar Subramanian, Bhanwar Singh | 2003-03-18 |