Issued Patents 2003
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6606738 | Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology | Scott A. Bell, Marina V. Plat, Chih-Yuh Yang | 2003-08-12 |